{"created":"2023-06-20T16:33:54.431802+00:00","id":2950,"links":{},"metadata":{"_buckets":{"deposit":"e757773d-dde5-4b38-be64-bef1cee1ad0d"},"_deposit":{"created_by":3,"id":"2950","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"2950"},"status":"published"},"_oai":{"id":"oai:kindai.repo.nii.ac.jp:00002950","sets":["14:2667:2668","21:2669:2670"]},"author_link":["3120","3119"],"item_8_alternative_title_3":{"attribute_name":"その他（別言語等）のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Development of polishing method for next-generation opt-electronic materials producing atomically-smooth surfaces"}]},"item_8_biblio_info_21":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2014-01-01","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"4","bibliographicPageStart":"1","bibliographic_titles":[{"bibliographic_title":"科学研究費助成事業研究成果報告書 (2014. )"}]}]},"item_8_description_33":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"研究成果の概要（和文): 本研究では, 触媒を用いた化学エッチングを応用した微粒子・薬液フリー平坦化法を開発し, 既存の技術では実現することが困難であったダメージレス超平坦GaN表面を高能率かつ安定的に創生することを目的とした研究開発を実施した. その結果, 2インチ基板の全面にわたって既存の技術では到達が困難である原子レベルの平坦な表面が得られた. また, 加工時間を数十時間から60分程度までに短縮することができた. 本加工法によって得られたGaN表面は優れた結晶性や発光特性, 電気特性を有することが明らかとなった.                     研究成果の概要（英文): In this research, a novel abrasive-free polishing process for GaN surface utilizing a chemical etching with catalyst has been developed to obtain damage-free and super-smooth GaN surfaces with a high removal efficiency. Atomically-smooth surface can be achieved over an entire wafer (2 inch in diameter) surface by the proposed method. The polishing duration to obtain a flat GaN surface were reduced from several tens of hours to approximately 60 min compared with a conventional polishing method. The processed GaN surface showed a superior crystallographic, luminescence and electrical properties to that processed by a mechanical polishing.","subitem_description_type":"Abstract"}]},"item_8_description_36":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"研究種目：若手研究(B);  研究期間：2012～2014;   課題番号：24760110;   研究分野：精密加工学;   科研費の分科・細目：","subitem_description_type":"Other"}]},"item_8_description_37":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"Research Paper","subitem_description_type":"Other"}]},"item_8_description_41":{"attribute_name":"フォーマット","attribute_value_mlt":[{"subitem_description":"application/pdf","subitem_description_type":"Other"}]},"item_8_publisher_14":{"attribute_name":"出版者 名前","attribute_value_mlt":[{"subitem_publisher":"近畿大学"}]},"item_8_relation_11":{"attribute_name":"著者 外部リンク","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_text":"https://kaken.nii.ac.jp/d/r/70531474.ja.html"}]},{"subitem_relation_name":[{"subitem_relation_name_text":"https://kaken.nii.ac.jp/d/r/80464238.ja.html"}]}]},"item_8_text_10":{"attribute_name":"著者 役割","attribute_value_mlt":[{"subitem_text_value":"研究代表者"},{"subitem_text_value":"研究協力者"}]},"item_8_text_7":{"attribute_name":"著者(英)","attribute_value_mlt":[{"subitem_text_language":"en","subitem_text_value":"MURATA, Junji"},{"subitem_text_language":"en","subitem_text_value":"HATTORI, Azusa"}]},"item_8_text_8":{"attribute_name":"著者 所属","attribute_value_mlt":[{"subitem_text_value":"近畿大学理工学部; 講師"},{"subitem_text_value":"大阪大学産業科学研究所; 助教"}]},"item_8_text_9":{"attribute_name":"著者所属(翻訳)","attribute_value_mlt":[{"subitem_text_value":"Kinki University"},{"subitem_text_value":"Osaka University"}]},"item_8_version_type_12":{"attribute_name":"版","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"村田,  順二"},{"creatorName":"ムラタ, ジュンジ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{},{}]},{"creatorNames":[{"creatorName":"服部,  梓"},{"creatorName":"ハットリ, アズサ","creatorNameLang":"ja-Kana"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2016-02-17"}],"displaytype":"detail","filename":"24760110seika.pdf","filesize":[{"value":"693.1 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"24760110seika.pdf","url":"https://kindai.repo.nii.ac.jp/record/2950/files/24760110seika.pdf"},"version_id":"e4b9fe61-8768-4c1f-9640-8651b3dd5c93"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"窒化ガリウム","subitem_subject_scheme":"Other"},{"subitem_subject":"研磨加工","subitem_subject_scheme":"Other"},{"subitem_subject":"触媒","subitem_subject_scheme":"Other"},{"subitem_subject":"エッチング","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"research report","resourceuri":"http://purl.org/coar/resource_type/c_18ws"}]},"item_title":"次世代オプトエレクトロニクス基板の原子スケール平坦化技術の開発","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"次世代オプトエレクトロニクス基板の原子スケール平坦化技術の開発"}]},"item_type_id":"8","owner":"3","path":["2668","2670"],"pubdate":{"attribute_name":"公開日","attribute_value":"2015-11-19"},"publish_date":"2015-11-19","publish_status":"0","recid":"2950","relation_version_is_last":true,"title":["次世代オプトエレクトロニクス基板の原子スケール平坦化技術の開発"],"weko_creator_id":"3","weko_shared_id":-1},"updated":"2023-06-21T01:51:31.895706+00:00"}