@article{oai:kindai.repo.nii.ac.jp:00013860,
 author = {白石,  浩平 and 山田,  康枝 and 今城,  明典 and 伊藤,  大時 and 農宗,  辰己},
 journal = {近畿大学次世代基盤技術研究所報告, Kinki University Research Institute of Fundamental Technology for Next Generation},
 month = {Jun},
 note = {Poly { 2-[ (Methacryloyloxy) ethyl ] dimethyl - (3-sulfoproryl) ammonium hydroxide } [ poly (SBMA)] with upper critical solution temperature(UCST) was grafted onto a glass substrate by surface initiated radical polymerization. From the scanning probe microscopy(SPM)measurements, poly(SBMA) brushes were observed on the glass substrate(g-glass). From the contact angle(Θ) measurements to water at 26℃, the Θ values of g-glass increased from Θ=21°(the untreated glass) to Θ=54°. On the other hand, the Θvalues at 40℃, the Θvalues of g-glass decreased from Θ=54°to Θ=45°. After being HeLa cells attached and proliferated on the g-glass at 30℃ under UCST of poly(SBMA) burshes, The HeLa cells attached were thermally exfoliated by increasing culture temperature over 37℃ for 2 h. The number of thermal exfoliation of HeLa cells on the g-glass was higher than that on untreated glass., Ⅲ.論文集, application/pdf},
 pages = {49--53},
 title = {〈原著論文〉UCST型スルホベタイン系ポリマーを表面修飾したガラス基板の調製とHeLa細胞の温度刺激はく離},
 volume = {5},
 year = {2014},
 yomi = {シライシ, コウヘイ and ヤマダ, ヤスエ and イマジョウ, アキノリ and イトウ, タイジ and ノウソウ, タツキ}
}